30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Bernhard Sartory
  • S. Braun
  • J. Gluch
  • M. Rosenthal
  • Manfred C. Burghammer
  • S. Niese
  • A. Kubec

External Organisational units

  • Fraunhofer Institute for Material and Beam Technology (IWS)
  • Fraunhofer IKTS
  • ESRF
  • AXO Dresden GmbH
  • Materials Center Leoben Forschungs GmbH
  • Erich Schmid Institute of Materials Science

Details

Original languageEnglish
Pages (from-to)862-873
JournalActa materialia
Volume144
DOIs
Publication statusPublished - 2018