TY - JOUR

T1 - Thermal stability of MoNbTaTiW, MoNbTaVW and CrMoNbTaW thin films deposited by high power impulse magnetron sputtering

AU - Gruber, Georg

AU - Lassnig, Alice

AU - Žák, Stanislav

AU - Gammer, Christoph

AU - Cordill, Megan

AU - Franz, Robert

N1 - Publisher Copyright: © 2022 The Authors

PY - 2023/2/15

Y1 - 2023/2/15

N2 - With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 °C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin 2Ψ method revealed a general reduction of the stress with annealing temperature due to defect annihilation.

AB - With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 °C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin 2Ψ method revealed a general reduction of the stress with annealing temperature due to defect annihilation.

UR - http://www.scopus.com/inward/record.url?scp=85144826112&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2022.129189

DO - 10.1016/j.surfcoat.2022.129189

M3 - Article

VL - 454.2023

JO - Surface & coatings technology

JF - Surface & coatings technology

SN - 0257-8972

IS - 15 February

M1 - 129189

ER -