The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings
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The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings. / Grasser, Stephan; Daniel, Rostislav; Mitterer, Christian.
Proceedings 12th International Conference on Plasma Surface Engineering. 2010. S. 389-389.
Proceedings 12th International Conference on Plasma Surface Engineering. 2010. S. 389-389.
Publikationen: Beitrag in Buch/Bericht/Konferenzband › Beitrag in Konferenzband
Harvard
Grasser, S, Daniel, R & Mitterer, C 2010, The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings. in Proceedings 12th International Conference on Plasma Surface Engineering. S. 389-389.
APA
Grasser, S., Daniel, R., & Mitterer, C. (2010). The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings. In Proceedings 12th International Conference on Plasma Surface Engineering (S. 389-389)
Vancouver
Grasser S, Daniel R, Mitterer C. The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings. in Proceedings 12th International Conference on Plasma Surface Engineering. 2010. S. 389-389
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Bibtex - Download
@inproceedings{b5f90081e1d645a2a0229e42b45c7321,
title = "The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings",
author = "Stephan Grasser and Rostislav Daniel and Christian Mitterer",
year = "2010",
language = "English",
pages = "389--389",
booktitle = "Proceedings 12th International Conference on Plasma Surface Engineering",
}
RIS (suitable for import to EndNote) - Download
TY - GEN
T1 - The effect of pulsed biasing on the microstructure and mechanical properties of sputtered TiB2 coatings
AU - Grasser, Stephan
AU - Daniel, Rostislav
AU - Mitterer, Christian
PY - 2010
Y1 - 2010
M3 - Conference contribution
SP - 389
EP - 389
BT - Proceedings 12th International Conference on Plasma Surface Engineering
ER -
