Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

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Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. / Pang, Jinbo; Mendes, Rafael G.; Wrobel, Pawel S. et al.
in: ACS nano, Jahrgang 11.2017, Nr. 2, 01.2017, S. 1946-1956.

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Harvard

Pang, J, Mendes, RG, Wrobel, PS, Wlodarski, MD, Ta, HQ, Zhao, L, Giebeler, L, Trzebicka, B, Gemming, T, Fu, L, Liu, Z, Eckert, J, Bachmatiuk, A & Ruemmeli, MH 2017, 'Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition', ACS nano, Jg. 11.2017, Nr. 2, S. 1946-1956. https://doi.org/10.1021/acsnano.6b08069

APA

Pang, J., Mendes, R. G., Wrobel, P. S., Wlodarski, M. D., Ta, H. Q., Zhao, L., Giebeler, L., Trzebicka, B., Gemming, T., Fu, L., Liu, Z., Eckert, J., Bachmatiuk, A., & Ruemmeli, M. H. (2017). Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. ACS nano, 11.2017(2), 1946-1956. https://doi.org/10.1021/acsnano.6b08069

Vancouver

Pang J, Mendes RG, Wrobel PS, Wlodarski MD, Ta HQ, Zhao L et al. Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. ACS nano. 2017 Jan;11.2017(2):1946-1956. doi: 10.1021/acsnano.6b08069

Author

Pang, Jinbo ; Mendes, Rafael G. ; Wrobel, Pawel S. et al. / Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. in: ACS nano. 2017 ; Jahrgang 11.2017, Nr. 2. S. 1946-1956.

Bibtex - Download

@article{c4edfd3e1149417790d69c8fc24cb6ac,
title = "Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition",
author = "Jinbo Pang and Mendes, {Rafael G.} and Wrobel, {Pawel S.} and Wlodarski, {Michal D.} and Ta, {Huy Quang} and Liang Zhao and Lars Giebeler and Barbara Trzebicka and Thomas Gemming and Lei Fu and Zhongfan Liu and J{\"u}rgen Eckert and Alicja Bachmatiuk and Ruemmeli, {Mark H.}",
year = "2017",
month = jan,
doi = "10.1021/acsnano.6b08069",
language = "English",
volume = "11.2017",
pages = "1946--1956",
journal = "ACS nano",
issn = "1936-0851",
publisher = "American Chemical Society",
number = "2",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

AU - Pang, Jinbo

AU - Mendes, Rafael G.

AU - Wrobel, Pawel S.

AU - Wlodarski, Michal D.

AU - Ta, Huy Quang

AU - Zhao, Liang

AU - Giebeler, Lars

AU - Trzebicka, Barbara

AU - Gemming, Thomas

AU - Fu, Lei

AU - Liu, Zhongfan

AU - Eckert, Jürgen

AU - Bachmatiuk, Alicja

AU - Ruemmeli, Mark H.

PY - 2017/1

Y1 - 2017/1

U2 - 10.1021/acsnano.6b08069

DO - 10.1021/acsnano.6b08069

M3 - Article

VL - 11.2017

SP - 1946

EP - 1956

JO - ACS nano

JF - ACS nano

SN - 1936-0851

IS - 2

ER -

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