Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5. / Hollerweger, Robert; Holec, David; Paultisch, J. et al.
in: Journal of physics / D, Applied physics, Jahrgang 46, 2013, S. 335203-335210.
in: Journal of physics / D, Applied physics, Jahrgang 46, 2013, S. 335203-335210.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Hollerweger, R, Holec, D, Paultisch, J, Rachbauer, R, Polcik, P & Mayrhofer, PH 2013, 'Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5', Journal of physics / D, Applied physics, Jg. 46, S. 335203-335210. https://doi.org/10.1088/0022-3727/46/33/335203
APA
Hollerweger, R., Holec, D., Paultisch, J., Rachbauer, R., Polcik, P., & Mayrhofer, P. H. (2013). Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5. Journal of physics / D, Applied physics, 46, 335203-335210. https://doi.org/10.1088/0022-3727/46/33/335203
Vancouver
Hollerweger R, Holec D, Paultisch J, Rachbauer R, Polcik P, Mayrhofer PH. Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5. Journal of physics / D, Applied physics. 2013;46:335203-335210. doi: 10.1088/0022-3727/46/33/335203
Author
Bibtex - Download
@article{8a435da99f9d4fc482ab66be9efb26e5,
title = "Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5",
author = "Robert Hollerweger and David Holec and J. Paultisch and Richard Rachbauer and P. Polcik and P.H. Mayrhofer",
year = "2013",
doi = "10.1088/0022-3727/46/33/335203",
language = "English",
volume = "46",
pages = "335203--335210",
journal = "Journal of physics / D, Applied physics",
issn = "0022-3727",
publisher = "IOP Publishing Ltd.",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5
AU - Hollerweger, Robert
AU - Holec, David
AU - Paultisch, J.
AU - Rachbauer, Richard
AU - Polcik, P.
AU - Mayrhofer, P.H.
PY - 2013
Y1 - 2013
U2 - 10.1088/0022-3727/46/33/335203
DO - 10.1088/0022-3727/46/33/335203
M3 - Article
VL - 46
SP - 335203
EP - 335210
JO - Journal of physics / D, Applied physics
JF - Journal of physics / D, Applied physics
SN - 0022-3727
ER -
