Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Standard

Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5. / Hollerweger, Robert; Holec, David; Paultisch, J. et al.
in: Journal of physics / D, Applied physics, Jahrgang 46, 2013, S. 335203-335210.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Vancouver

Bibtex - Download

@article{8a435da99f9d4fc482ab66be9efb26e5,
title = "Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5",
author = "Robert Hollerweger and David Holec and J. Paultisch and Richard Rachbauer and P. Polcik and P.H. Mayrhofer",
year = "2013",
doi = "10.1088/0022-3727/46/33/335203",
language = "English",
volume = "46",
pages = "335203--335210",
journal = "Journal of physics / D, Applied physics",
issn = "0022-3727",
publisher = "IOP Publishing Ltd.",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5

AU - Hollerweger, Robert

AU - Holec, David

AU - Paultisch, J.

AU - Rachbauer, Richard

AU - Polcik, P.

AU - Mayrhofer, P.H.

PY - 2013

Y1 - 2013

U2 - 10.1088/0022-3727/46/33/335203

DO - 10.1088/0022-3727/46/33/335203

M3 - Article

VL - 46

SP - 335203

EP - 335210

JO - Journal of physics / D, Applied physics

JF - Journal of physics / D, Applied physics

SN - 0022-3727

ER -