Influence of Pulsed Substrate Bias on the Structure and Properties of CrN Coatings Deposited by Reactive DC Magnetron Sputtering

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

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Influence of Pulsed Substrate Bias on the Structure and Properties of CrN Coatings Deposited by Reactive DC Magnetron Sputtering. / Grasser, Stephan; Gassner, Gert; Walter, Claudia et al.
2006. Postersitzung präsentiert bei Junior Euromat 2006, Lausanne, Schweiz.

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Bibtex - Download

@conference{2f0a7090bcfc4d519fb5cf7a90f603e1,
title = "Influence of Pulsed Substrate Bias on the Structure and Properties of CrN Coatings Deposited by Reactive DC Magnetron Sputtering",
author = "Stephan Grasser and Gert Gassner and Claudia Walter and Rostislav Daniel and Christian Mitterer",
year = "2006",
language = "English",
note = "Juniior Euromat 2006 ; Conference date: 04-09-2006 Through 08-09-2006",

}

RIS (suitable for import to EndNote) - Download

TY - CONF

T1 - Influence of Pulsed Substrate Bias on the Structure and Properties of CrN Coatings Deposited by Reactive DC Magnetron Sputtering

AU - Grasser, Stephan

AU - Gassner, Gert

AU - Walter, Claudia

AU - Daniel, Rostislav

AU - Mitterer, Christian

PY - 2006

Y1 - 2006

M3 - Poster

T2 - Juniior Euromat 2006

Y2 - 4 September 2006 through 8 September 2006

ER -