Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method. / Schöngrundner, Ronald; Treml, Ruth; Antretter, Thomas et al.
in: Thin solid films, 2014, S. 321-330.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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@article{d7b3277c227444e4aa2561c61891eb3c,
title = "Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method",
author = "Ronald Sch{\"o}ngrundner and Ruth Treml and Thomas Antretter and Darian Kozic and Werner Ecker and Daniel Kiener",
year = "2014",
doi = "10.1016/j.tsf.2014.06.003",
language = "English",
pages = "321--330",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

AU - Schöngrundner, Ronald

AU - Treml, Ruth

AU - Antretter, Thomas

AU - Kozic, Darian

AU - Ecker, Werner

AU - Kiener, Daniel

PY - 2014

Y1 - 2014

U2 - 10.1016/j.tsf.2014.06.003

DO - 10.1016/j.tsf.2014.06.003

M3 - Article

SP - 321

EP - 330

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

ER -