Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method
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Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method. / Schöngrundner, Ronald; Treml, Ruth; Antretter, Thomas et al.
in: Thin solid films, 2014, S. 321-330.
in: Thin solid films, 2014, S. 321-330.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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Schöngrundner R, Treml R, Antretter T, Kozic D, Ecker W, Kiener D. Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method. Thin solid films. 2014;321-330. doi: 10.1016/j.tsf.2014.06.003
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@article{d7b3277c227444e4aa2561c61891eb3c,
title = "Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method",
author = "Ronald Sch{\"o}ngrundner and Ruth Treml and Thomas Antretter and Darian Kozic and Werner Ecker and Daniel Kiener",
year = "2014",
doi = "10.1016/j.tsf.2014.06.003",
language = "English",
pages = "321--330",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method
AU - Schöngrundner, Ronald
AU - Treml, Ruth
AU - Antretter, Thomas
AU - Kozic, Darian
AU - Ecker, Werner
AU - Kiener, Daniel
PY - 2014
Y1 - 2014
U2 - 10.1016/j.tsf.2014.06.003
DO - 10.1016/j.tsf.2014.06.003
M3 - Article
SP - 321
EP - 330
JO - Thin solid films
JF - Thin solid films
SN - 0040-6090
ER -
