TY - JOUR

T1 - Angular-dependent deposition of MoNbTaVW HEA thin films by three different physical vapor deposition methods

AU - Xia, Ao

AU - Togni, Allessandro

AU - Hirn, Sabrina

AU - Bolelli, Giovanni

AU - Lusvarghi, Luca

AU - Franz, Robert

PY - 2020/1/17

Y1 - 2020/1/17

N2 - Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.

AB - Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.

UR - http://www.scopus.com/inward/record.url?scp=85078571634&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2020.125356

DO - 10.1016/j.surfcoat.2020.125356

M3 - Article

VL - 385.2020

JO - Surface & coatings technology

JF - Surface & coatings technology

SN - 0257-8972

IS - March

M1 - 125356

ER -