Properties of reactively sputtered W-Si-N films

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Properties of reactively sputtered W-Si-N films. / Musil, J.; Daniel, R.; Soldán, J. et al.
In: Surface & coatings technology, 2006.

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Musil J, Daniel R, Soldán J, Zeman P. Properties of reactively sputtered W-Si-N films. Surface & coatings technology. 2006. doi: 10.1016/j.surfcoat.2004.12.004

Bibtex - Download

@article{158c6bd7e9fd4a2ca9b0e9f106fc43f5,
title = "Properties of reactively sputtered W-Si-N films",
author = "J. Musil and R. Daniel and J. Sold{\'a}n and P. Zeman",
year = "2006",
doi = "10.1016/j.surfcoat.2004.12.004",
language = "English",
journal = "Surface & coatings technology",
issn = "0257-8972",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Properties of reactively sputtered W-Si-N films

AU - Musil, J.

AU - Daniel, R.

AU - Soldán, J.

AU - Zeman, P.

PY - 2006

Y1 - 2006

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-32844462100&partnerID=MN8TOARS

U2 - 10.1016/j.surfcoat.2004.12.004

DO - 10.1016/j.surfcoat.2004.12.004

M3 - Article

JO - Surface & coatings technology

JF - Surface & coatings technology

SN - 0257-8972

ER -