TY - JOUR

T1 - Plasma Processing and Treatment of 2D Transition Metal Dichalcogenides

T2 - Tuning Properties and Defect Engineering

AU - Sovizi, Saeed

AU - Angizi, Shayan

AU - Alem, Sayed

AU - Goodarzi, Reyhaneh

AU - Boyuk, Mohammad Reza Rahmani Taji

AU - Ghanbari, Hajar

AU - Szoszkiewicz, Robert

AU - Simchi, Abdolreza

AU - Kruse, Peter

PY - 2023/12/4

Y1 - 2023/12/4

N2 - Two-dimensional transition metal dichalcogenides (TMDs) offer fascinating opportunities for fundamental nanoscale science and various technological applications. They are a promising platform for next generation optoelectronics and energy harvesting devices due to their exceptional characteristics at the nanoscale, such as tunable bandgap and strong light-matter interactions. The performance of TMD-based devices is mainly governed by the structure, composition, size, defects, and the state of their interfaces. Many properties of TMDs are influenced by the method of synthesis so numerous studies have focused on processing high-quality TMDs with controlled physicochemical properties. Plasma-based methods are cost-effective, well controllable, and scalable techniques that have recently attracted researchers’ interest in the synthesis and modification of 2D TMDs. TMDs’ reactivity toward plasma offers numerous opportunities to modify the surface of TMDs, including functionalization, defect engineering, doping, oxidation, phase engineering, etching, healing, morphological changes, and altering the surface energy. Here we comprehensively review all roles of plasma in the realm of TMDs. The fundamental science behind plasma processing and modification of TMDs and their applications in different fields are presented and discussed. Future perspectives and challenges are highlighted to demonstrate the prominence of TMDs and the importance of surface engineering in next-generation optoelectronic applications.

AB - Two-dimensional transition metal dichalcogenides (TMDs) offer fascinating opportunities for fundamental nanoscale science and various technological applications. They are a promising platform for next generation optoelectronics and energy harvesting devices due to their exceptional characteristics at the nanoscale, such as tunable bandgap and strong light-matter interactions. The performance of TMD-based devices is mainly governed by the structure, composition, size, defects, and the state of their interfaces. Many properties of TMDs are influenced by the method of synthesis so numerous studies have focused on processing high-quality TMDs with controlled physicochemical properties. Plasma-based methods are cost-effective, well controllable, and scalable techniques that have recently attracted researchers’ interest in the synthesis and modification of 2D TMDs. TMDs’ reactivity toward plasma offers numerous opportunities to modify the surface of TMDs, including functionalization, defect engineering, doping, oxidation, phase engineering, etching, healing, morphological changes, and altering the surface energy. Here we comprehensively review all roles of plasma in the realm of TMDs. The fundamental science behind plasma processing and modification of TMDs and their applications in different fields are presented and discussed. Future perspectives and challenges are highlighted to demonstrate the prominence of TMDs and the importance of surface engineering in next-generation optoelectronic applications.

KW - 2D Materials

KW - Plasma Treatment

KW - Transition Metal Dichalcogenides

KW - Defect Engineering

U2 - 10.1021/acs.chemrev.3c00147

DO - 10.1021/acs.chemrev.3c00147

M3 - Review article

VL - 2023

SP - 13869

EP - 13951

JO - Chemical reviews

JF - Chemical reviews

SN - 0009-2665

IS - 24

ER -