Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Thomas Höfler
  • Anna M. Track
  • Peter Pacher
  • Heinz-Georg Flesch
  • Georg Koller
  • Michael G. Ramsey
  • Robert Schennach
  • Roland Resel
  • Georg Trimmel

Details

Translated title of the contributionPhotoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification
Original languageEnglish
Pages (from-to)287-293
JournalMaterials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)
Volume119
DOIs
Publication statusPublished - 2010