Influence of TiO2(110) surface roughness on growth and stability of thin organic films

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Influence of TiO2(110) surface roughness on growth and stability of thin organic films. / Szajna, Konrad; Kratzer, Markus; Wrana, Dominik et al.
In: Journal of chemical physics (The journal of chemical physics), Vol. 145, 2016.

Research output: Contribution to journalArticleResearchpeer-review

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@article{f243a748410c468fb53c3e481a3215e7,
title = "Influence of TiO2(110) surface roughness on growth and stability of thin organic films",
keywords = "Ion Bombardment, Hexaphenyl, AFM, TiO2(110), stability",
author = "Konrad Szajna and Markus Kratzer and Dominik Wrana and Carlo Mennucci and Benedykt Jany and {Buatier de Mongeot}, Francesco and Christian Teichert and Franciszek Krok",
year = "2016",
language = "English",
volume = "145",
journal = "Journal of chemical physics (The journal of chemical physics)",
issn = "0021-9606",
publisher = "American Institute of Physics Publising LLC",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Influence of TiO2(110) surface roughness on growth and stability of thin organic films

AU - Szajna, Konrad

AU - Kratzer, Markus

AU - Wrana, Dominik

AU - Mennucci, Carlo

AU - Jany, Benedykt

AU - Buatier de Mongeot, Francesco

AU - Teichert, Christian

AU - Krok, Franciszek

PY - 2016

Y1 - 2016

KW - Ion Bombardment

KW - Hexaphenyl

KW - AFM

KW - TiO2(110)

KW - stability

M3 - Article

VL - 145

JO - Journal of chemical physics (The journal of chemical physics)

JF - Journal of chemical physics (The journal of chemical physics)

SN - 0021-9606

ER -