Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films
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Authors
Organisational units
External Organisational units
- Department of Materials Science and Engineering, Ghent University
- Erich Schmid Institute of Materials Science
Abstract
The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW) 1−xN x high entropy alloy thin films is investigated. The films were synthesized by two different physical vapor deposition methods, cathodic arc deposition and direct current magnetron sputtering, onto silicon and polyimide substrates. Regardless of the deposition method, a change from body centered cubic to face centered cubic structure was observed with increasing nitrogen content in the film. This structural change was accompanied by an increase in hardness as measured by nanoindentation but also by a material embrittlement as determined from tensile straining tests.
Details
Original language | English |
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Article number | 156740 |
Number of pages | 11 |
Journal | Journal of alloys and compounds |
Volume | 850.2021 |
Issue number | 5 January |
DOIs | |
Publication status | E-pub ahead of print - 20 Aug 2020 |