Influence of Pulsed Substrate Bias on the Structure and Properties of CrN Coatings Deposited by Reactive DC Magnetron Sputtering

Research output: Contribution to conferencePosterResearchpeer-review

Details

Translated title of the contributionInfluence of Pulsed Substrate Bias on the Structure and Properties of CrN Coatings Deposited by Reactive DC Magnetron Sputtering
Original languageEnglish
Publication statusPublished - 2006
EventJuniior Euromat 2006 - Lausanne, Switzerland
Duration: 4 Sept 20068 Sept 2006

Conference

ConferenceJuniior Euromat 2006
Country/TerritorySwitzerland
CityLausanne
Period4/09/068/09/06