High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • René Hammer
  • Bernhard Sartory
  • Georg Parteder
  • Jochen Kraft
  • Stefan Defregger

External Organisational units

  • Materials Center Leoben Forschungs GmbH
  • Erich Schmid Institute of Materials Science
  • Austria-Mikro-Syst.-Intl. GmbH

Details

Original languageEnglish
Pages (from-to)72-78
Number of pages7
JournalMaterials and Design
Volume132.2017
Issue number15 October
Early online date23 Jun 2017
DOIs
Publication statusPublished - 15 Oct 2017