High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer
Research output: Contribution to journal › Article › Research › peer-review
Authors
Organisational units
External Organisational units
- Materials Center Leoben Forschungs GmbH
- Erich Schmid Institute of Materials Science
- Austria-Mikro-Syst.-Intl. GmbH
Details
Original language | English |
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Pages (from-to) | 72-78 |
Number of pages | 7 |
Journal | Materials and Design |
Volume | 132.2017 |
Issue number | 15 October |
Early online date | 23 Jun 2017 |
DOIs | |
Publication status | Published - 15 Oct 2017 |