Hierarchy of adhesion forces in patterns of photoreactive surface layers

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Hierarchy of adhesion forces in patterns of photoreactive surface layers. / Hlawacek, Gregor; Shen, Quan; Teichert, Christian et al.
In: Journal of chemical physics (The journal of chemical physics), Vol. 130, 2009, p. 44703-1-44703-5.

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@article{51bdc34c556c4a2995f36821ba0f7e5e,
title = "Hierarchy of adhesion forces in patterns of photoreactive surface layers",
author = "Gregor Hlawacek and Quan Shen and Christian Teichert and Alexandra Lex and Gregor Trimmel and Wolfgang Kern",
year = "2009",
doi = "http://dx.doi.org/http://dx.doi.org/10.1063/1.3062841",
language = "English",
volume = "130",
pages = "44703--1--44703--5",
journal = "Journal of chemical physics (The journal of chemical physics)",
issn = "0021-9606",
publisher = "American Institute of Physics Publising LLC",

}

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TY - JOUR

T1 - Hierarchy of adhesion forces in patterns of photoreactive surface layers

AU - Hlawacek, Gregor

AU - Shen, Quan

AU - Teichert, Christian

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Kern, Wolfgang

PY - 2009

Y1 - 2009

U2 - http://dx.doi.org/http://dx.doi.org/10.1063/1.3062841

DO - http://dx.doi.org/http://dx.doi.org/10.1063/1.3062841

M3 - Article

VL - 130

SP - 44703-1-44703-5

JO - Journal of chemical physics (The journal of chemical physics)

JF - Journal of chemical physics (The journal of chemical physics)

SN - 0021-9606

ER -