HfO2 as gate dielectrics for Ge-based devices

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Authors

  • S. Spiga
  • C. Wiemer
  • G. Scarel
  • G. Tallarida
  • G. Seguini
  • M. Perego
  • S. Ferrari
  • M. Fanciulli
  • G. Mavrou
  • A. Dimoulas
  • Sascha Kremmer
  • G. Pavia

Organisational units

Details

Translated title of the contributionHfO2 as gate dielectrics for Ge-based devices
Original languageEnglish
Publication statusPublished - 2007