Behavior of SiO2 nanostrures under intense extreme ultraviolet illumination
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Behavior of SiO2 nanostrures under intense extreme ultraviolet illumination. / Teichert, Christian; Kremmer, Sascha.
In: Journal of applied physics, Vol. 97, 2005.
In: Journal of applied physics, Vol. 97, 2005.
Research output: Contribution to journal › Article › Research › peer-review
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Teichert C, Kremmer S. Behavior of SiO2 nanostrures under intense extreme ultraviolet illumination. Journal of applied physics. 2005;97. doi: 10.1063/1.1904723
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Bibtex - Download
@article{9d47ae8dc42d49d9bbab1648495c2c56,
title = "Behavior of SiO2 nanostrures under intense extreme ultraviolet illumination",
author = "Christian Teichert and Sascha Kremmer",
year = "2005",
doi = "10.1063/1.1904723",
language = "English",
volume = "97",
journal = "Journal of applied physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Behavior of SiO2 nanostrures under intense extreme ultraviolet illumination
AU - Teichert, Christian
AU - Kremmer, Sascha
PY - 2005
Y1 - 2005
U2 - 10.1063/1.1904723
DO - 10.1063/1.1904723
M3 - Article
VL - 97
JO - Journal of applied physics
JF - Journal of applied physics
SN - 0021-8979
ER -
