AFM investigation of silicon substrates for chemical vapour deposition of diamond films

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AFM investigation of silicon substrates for chemical vapour deposition of diamond films. / Prohaska, Thomas; Fuchs, G. M.; FRIEDBACHER, G et al.
In: Fresenius' journal of analytical chemistry , 1995, p. 698-701.

Research output: Contribution to journalArticleResearchpeer-review

Harvard

Prohaska, T, Fuchs, GM, FRIEDBACHER, G, Schwarzbach, D, Bouveresse, E & GRASSERBAUER, M 1995, 'AFM investigation of silicon substrates for chemical vapour deposition of diamond films', Fresenius' journal of analytical chemistry , pp. 698-701.

APA

Prohaska, T., Fuchs, G. M., FRIEDBACHER, G., Schwarzbach, D., Bouveresse, E., & GRASSERBAUER, M. (1995). AFM investigation of silicon substrates for chemical vapour deposition of diamond films. Fresenius' journal of analytical chemistry , 698-701.

Vancouver

Bibtex - Download

@article{8b903d05211b49bf878c14ce567c7fc9,
title = "AFM investigation of silicon substrates for chemical vapour deposition of diamond films",
author = "Thomas Prohaska and Fuchs, {G. M.} and G FRIEDBACHER and D. Schwarzbach and E. Bouveresse and M GRASSERBAUER",
year = "1995",
language = "English",
pages = " 698--701",
journal = "Fresenius' journal of analytical chemistry ",
issn = "0937-0633",
publisher = "Springer Berlin",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - AFM investigation of silicon substrates for chemical vapour deposition of diamond films

AU - Prohaska, Thomas

AU - Fuchs, G. M.

AU - FRIEDBACHER, G

AU - Schwarzbach, D.

AU - Bouveresse, E.

AU - GRASSERBAUER, M

PY - 1995

Y1 - 1995

M3 - Article

SP - 698

EP - 701

JO - Fresenius' journal of analytical chemistry

JF - Fresenius' journal of analytical chemistry

SN - 0937-0633

ER -