AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy
Research output: Contribution to journal › Article › Research › peer-review
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AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy. / Prohaska, Thomas; FRIEDBACHER, G.
In: Applied surface science, 1996, p. 91-98.
In: Applied surface science, 1996, p. 91-98.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Prohaska, T & FRIEDBACHER, G 1996, 'AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy', Applied surface science, pp. 91-98.
APA
Prohaska, T., & FRIEDBACHER, G. (1996). AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy. Applied surface science, 91-98.
Vancouver
Prohaska T, FRIEDBACHER G. AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy. Applied surface science. 1996;91-98.
Author
Bibtex - Download
@article{f5fd192f237a4989aca082ff434e3dba,
title = "AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy",
author = "Thomas Prohaska and G FRIEDBACHER",
year = "1996",
language = "English",
pages = "91--98",
journal = "Applied surface science",
issn = "0169-4332",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - AFM and STM studies on In2O3 and ITO thin films deposited by Atomic Layer Epitaxy
AU - Prohaska, Thomas
AU - FRIEDBACHER, G
PY - 1996
Y1 - 1996
M3 - Article
SP - 91
EP - 98
JO - Applied surface science
JF - Applied surface science
SN - 0169-4332
ER -
