Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface

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Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface. / Zhang, Donglan; Wang, Jiong; Wu, Qing et al.
In: Surfaces and Interfaces, Vol. 2024, No. 49, 2024, p. 1-11.

Research output: Contribution to journalArticleResearchpeer-review

Vancouver

Zhang D, Wang J, Wu Q, Du Y, Holec D. Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface. Surfaces and Interfaces. 2024;2024(49):1-11. doi: 10.1016/j.surfin.2024.104418

Author

Zhang, Donglan ; Wang, Jiong ; Wu, Qing et al. / Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface. In: Surfaces and Interfaces. 2024 ; Vol. 2024, No. 49. pp. 1-11.

Bibtex - Download

@article{0fbe9d7e4f124937a9681dbf9f97175d,
title = "Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface",
author = "Donglan Zhang and Jiong Wang and Qing Wu and Yong Du and David Holec",
year = "2024",
doi = "10.1016/j.surfin.2024.104418",
language = "English",
volume = "2024",
pages = "1--11",
journal = "Surfaces and Interfaces",
issn = "2468-0230",
publisher = "Elsevier",
number = "49",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface

AU - Zhang, Donglan

AU - Wang, Jiong

AU - Wu, Qing

AU - Du, Yong

AU - Holec, David

PY - 2024

Y1 - 2024

U2 - 10.1016/j.surfin.2024.104418

DO - 10.1016/j.surfin.2024.104418

M3 - Article

VL - 2024

SP - 1

EP - 11

JO - Surfaces and Interfaces

JF - Surfaces and Interfaces

SN - 2468-0230

IS - 49

ER -