Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition. / Tkadletz, Michael; Hofer, Christina; Wüstefeld, Christina et al.
in: Acta Materialia, Jahrgang 174.2019, Nr. August, 2019, S. 195-205.
in: Acta Materialia, Jahrgang 174.2019, Nr. August, 2019, S. 195-205.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Tkadletz, M, Hofer, C, Wüstefeld, C, Schalk, N, Motylenko, M, Rafaja, D, Holzschuh, H, Bürgin, W, Sartory, B, Mitterer, C & Czettl, C 2019, 'Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition', Acta Materialia, Jg. 174.2019, Nr. August, S. 195-205. https://doi.org/10.1016/j.actamat.2019.05.044
APA
Tkadletz, M., Hofer, C., Wüstefeld, C., Schalk, N., Motylenko, M., Rafaja, D., Holzschuh, H., Bürgin, W., Sartory, B., Mitterer, C., & Czettl, C. (2019). Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition. Acta Materialia, 174.2019(August), 195-205. https://doi.org/10.1016/j.actamat.2019.05.044
Vancouver
Tkadletz M, Hofer C, Wüstefeld C, Schalk N, Motylenko M, Rafaja D et al. Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition. Acta Materialia. 2019;174.2019(August):195-205. doi: 10.1016/j.actamat.2019.05.044
Author
Bibtex - Download
@article{fde274e258c3434cb7c3366da058f6c8,
title = "Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition",
author = "Michael Tkadletz and Christina Hofer and Christina W{\"u}stefeld and Nina Schalk and Mykhaylo Motylenko and David Rafaja and Helga Holzschuh and Werner B{\"u}rgin and Bernhard Sartory and Christian Mitterer and Christoph Czettl",
year = "2019",
doi = "10.1016/j.actamat.2019.05.044",
language = "English",
volume = "174.2019",
pages = "195--205",
journal = "Acta Materialia",
issn = "1359-6454",
publisher = "Elsevier",
number = "August",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition
AU - Tkadletz, Michael
AU - Hofer, Christina
AU - Wüstefeld, Christina
AU - Schalk, Nina
AU - Motylenko, Mykhaylo
AU - Rafaja, David
AU - Holzschuh, Helga
AU - Bürgin, Werner
AU - Sartory, Bernhard
AU - Mitterer, Christian
AU - Czettl, Christoph
PY - 2019
Y1 - 2019
U2 - 10.1016/j.actamat.2019.05.044
DO - 10.1016/j.actamat.2019.05.044
M3 - Article
VL - 174.2019
SP - 195
EP - 205
JO - Acta Materialia
JF - Acta Materialia
SN - 1359-6454
IS - August
ER -
