The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

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The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM. / Khokar, Fawad S.; Hlawacek, Gregor; van Gastel, Raoul et al.
in: Surface Science, Jahrgang 606, 2012, S. 475-480.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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@article{3a49eb7aaa68408e906b1a99251e620a,
title = "The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM",
author = "Khokar, {Fawad S.} and Gregor Hlawacek and {van Gastel}, Raoul and Zandvliet, {Harold J. W.} and Christian Teichert and Bene Poelsema",
year = "2012",
doi = "10.1016/j.susc.2011.11.012",
language = "English",
volume = "606",
pages = "475--480",
journal = "Surface Science",
issn = "0043-2539",
publisher = "Elsevier",

}

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TY - JOUR

T1 - The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

AU - Khokar, Fawad S.

AU - Hlawacek, Gregor

AU - van Gastel, Raoul

AU - Zandvliet, Harold J. W.

AU - Teichert, Christian

AU - Poelsema, Bene

PY - 2012

Y1 - 2012

U2 - 10.1016/j.susc.2011.11.012

DO - 10.1016/j.susc.2011.11.012

M3 - Article

VL - 606

SP - 475

EP - 480

JO - Surface Science

JF - Surface Science

SN - 0043-2539

ER -