TY - THES

T1 - Synthesis and Characterization of High Entropy Alloy Nitrides

AU - Tabelander, Michael

N1 - no embargo

PY - 2023

Y1 - 2023

N2 - This thesis focuses on a comparative investigation of thin films based on MoNbTaW high entropy alloy (HEA) and (MoNbTaW)N high entropy metal nitrides (HEN) deposited using High Power Impulse Magnetron Sputtering (HiPIMS) at varying nitrogen pressures. The study revealed a gradual transition in microstructure of the deposited films from a body centered cubic to a face centered cubic lattice with the incorporation of nitrogen. Moreover, the incorporation of insufficient nitrogen resulted in an amorphous microstructure. All samples demonstrated a remarkable thermal stability up to 900 °C. However, the HEN films exhibited cracking during annealing due to high residual stresses, while the HEA films experienced delamination in a few instances, but cracking was not observed. Based on the findings from this study, the HEN films exhibit promising potential as hard coatings due to their excellent thermal stability. Further investigations are warranted to evaluate their suitability as diffusion barriers in high-power electronic applications.

AB - This thesis focuses on a comparative investigation of thin films based on MoNbTaW high entropy alloy (HEA) and (MoNbTaW)N high entropy metal nitrides (HEN) deposited using High Power Impulse Magnetron Sputtering (HiPIMS) at varying nitrogen pressures. The study revealed a gradual transition in microstructure of the deposited films from a body centered cubic to a face centered cubic lattice with the incorporation of nitrogen. Moreover, the incorporation of insufficient nitrogen resulted in an amorphous microstructure. All samples demonstrated a remarkable thermal stability up to 900 °C. However, the HEN films exhibited cracking during annealing due to high residual stresses, while the HEA films experienced delamination in a few instances, but cracking was not observed. Based on the findings from this study, the HEN films exhibit promising potential as hard coatings due to their excellent thermal stability. Further investigations are warranted to evaluate their suitability as diffusion barriers in high-power electronic applications.

KW - Hochentropielegierung

KW - Hochentropielegierungsnitride

KW - Dünnschicht

KW - High power impulse magnetron sputtering

KW - Thermische Stabilität

KW - Eigenspannung

KW - basierend auf MoNbTaW

KW - High entropy alloy

KW - High entropy alloy nitride

KW - Thin film

KW - High power impulse magnetron sputtering

KW - Thermal stability

KW - Residual stress

KW - MoNbTaW based

U2 - 10.34901/mul.pub.2023.228

DO - 10.34901/mul.pub.2023.228

M3 - Master's Thesis

ER -