Silicon distribution and silicide precipitation during annealing in an advanced multi-phase g-TiAl based alloy

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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Silicon distribution and silicide precipitation during annealing in an advanced multi-phase g-TiAl based alloy. / Klein, Thomas; Rashkova, Boryana; Holec, David et al.
in: Acta materialia, Jahrgang 110, 2016, S. 236-245.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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@article{f32cdd8a4b1449578a2951af2971747d,
title = "Silicon distribution and silicide precipitation during annealing in an advanced multi-phase g-TiAl based alloy",
author = "Thomas Klein and Boryana Rashkova and David Holec and Helmut Clemens and Svea Mayer",
year = "2016",
doi = "http://dx.doi.org/10.1016/j.actamat.2016.03.050",
language = "English",
volume = "110",
pages = "236--245",
journal = "Acta materialia",
issn = "1359-6454",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Silicon distribution and silicide precipitation during annealing in an advanced multi-phase g-TiAl based alloy

AU - Klein, Thomas

AU - Rashkova, Boryana

AU - Holec, David

AU - Clemens, Helmut

AU - Mayer, Svea

PY - 2016

Y1 - 2016

U2 - http://dx.doi.org/10.1016/j.actamat.2016.03.050

DO - http://dx.doi.org/10.1016/j.actamat.2016.03.050

M3 - Article

VL - 110

SP - 236

EP - 245

JO - Acta materialia

JF - Acta materialia

SN - 1359-6454

ER -