Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

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@article{0a37563a7e8a4f5583d604d95ce6f814,
title = "Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification",
author = "Thomas H{\"o}fler and Track, {Anna M.} and Peter Pacher and Quan Shen and Heinz-Georg Flesch and Gregor Hlawacek and Georg Koller and Ramsey, {Michael G.} and Robert Schennach and Roland Resel and Christian Teichert and Wolfgang Kern and Thomas Grie{\ss}er and Georg Trimmel",
year = "2010",
doi = "10.1016/j.matchemphys.2009.08.065",
language = "English",
volume = "119",
pages = "287--293",
journal = "Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)",
issn = "0254-0584",
publisher = "Elsevier",

}

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TY - JOUR

T1 - Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

AU - Höfler, Thomas

AU - Track, Anna M.

AU - Pacher, Peter

AU - Shen, Quan

AU - Flesch, Heinz-Georg

AU - Hlawacek, Gregor

AU - Koller, Georg

AU - Ramsey, Michael G.

AU - Schennach, Robert

AU - Resel, Roland

AU - Teichert, Christian

AU - Kern, Wolfgang

AU - Grießer, Thomas

AU - Trimmel, Georg

PY - 2010

Y1 - 2010

U2 - 10.1016/j.matchemphys.2009.08.065

DO - 10.1016/j.matchemphys.2009.08.065

M3 - Article

VL - 119

SP - 287

EP - 293

JO - Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)

JF - Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)

SN - 0254-0584

ER -