Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Standard

Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. / Höfler, Thomas; Track, Anna M.; Pacher, Peter et al.
in: Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials), Jahrgang 119, 2010, S. 287-293.

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Harvard

Höfler, T, Track, AM, Pacher, P, Shen, Q, Flesch, H-G, Hlawacek, G, Koller, G, Ramsey, MG, Schennach, R, Resel, R, Teichert, C, Kern, W, Grießer, T & Trimmel, G 2010, 'Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification', Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials), Jg. 119, S. 287-293. https://doi.org/10.1016/j.matchemphys.2009.08.065

APA

Höfler, T., Track, A. M., Pacher, P., Shen, Q., Flesch, H.-G., Hlawacek, G., Koller, G., Ramsey, M. G., Schennach, R., Resel, R., Teichert, C., Kern, W., Grießer, T., & Trimmel, G. (2010). Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials), 119, 287-293. https://doi.org/10.1016/j.matchemphys.2009.08.065

Vancouver

Höfler T, Track AM, Pacher P, Shen Q, Flesch HG, Hlawacek G et al. Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials). 2010;119:287-293. doi: 10.1016/j.matchemphys.2009.08.065

Author

Höfler, Thomas ; Track, Anna M. ; Pacher, Peter et al. / Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. in: Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials). 2010 ; Jahrgang 119. S. 287-293.

Bibtex - Download

@article{0a37563a7e8a4f5583d604d95ce6f814,
title = "Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification",
author = "Thomas H{\"o}fler and Track, {Anna M.} and Peter Pacher and Quan Shen and Heinz-Georg Flesch and Gregor Hlawacek and Georg Koller and Ramsey, {Michael G.} and Robert Schennach and Roland Resel and Christian Teichert and Wolfgang Kern and Thomas Grie{\ss}er and Georg Trimmel",
year = "2010",
doi = "10.1016/j.matchemphys.2009.08.065",
language = "English",
volume = "119",
pages = "287--293",
journal = "Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)",
issn = "0254-0584",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

AU - Höfler, Thomas

AU - Track, Anna M.

AU - Pacher, Peter

AU - Shen, Quan

AU - Flesch, Heinz-Georg

AU - Hlawacek, Gregor

AU - Koller, Georg

AU - Ramsey, Michael G.

AU - Schennach, Robert

AU - Resel, Roland

AU - Teichert, Christian

AU - Kern, Wolfgang

AU - Grießer, Thomas

AU - Trimmel, Georg

PY - 2010

Y1 - 2010

U2 - 10.1016/j.matchemphys.2009.08.065

DO - 10.1016/j.matchemphys.2009.08.065

M3 - Article

VL - 119

SP - 287

EP - 293

JO - Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)

JF - Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)

SN - 0254-0584

ER -

Beziehungsdiagramm anzeigen

360 Link

Zeitschriften in BUGL

Vom selben Autor

Mehr zeigen