Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions. / Grießer, Thomas; Höfler, T.; Temmel, S. et al.
in: Chemistry of materials, Jahrgang 19, 2008, S. 3011-3016.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Bibtex - Download

@article{50dc1d6a5e7c41fe912de9c8d4ade193,
title = "Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions",
author = "Thomas Grie{\ss}er and T. H{\"o}fler and S. Temmel and Wolfgang Kern and G. Trimmel",
year = "2008",
language = "English",
volume = "19",
pages = "3011--3016",
journal = "Chemistry of materials",
issn = "0897-4756",
publisher = "American Chemical Society",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions

AU - Grießer, Thomas

AU - Höfler, T.

AU - Temmel, S.

AU - Kern, Wolfgang

AU - Trimmel, G.

PY - 2008

Y1 - 2008

M3 - Article

VL - 19

SP - 3011

EP - 3016

JO - Chemistry of materials

JF - Chemistry of materials

SN - 0897-4756

ER -