Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Standard

Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions. / Grießer, Thomas; Höfler, Thomas; Temmel, Susanne et al.
2007. Postersitzung präsentiert bei Winterschool on “Interface Controlled and Functionalised Organic Films”, Irdning, Österreich.

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Harvard

Grießer, T, Höfler, T, Temmel, S, Kern, W & Trimmel, G 2007, 'Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions', Winterschool on “Interface Controlled and Functionalised Organic Films”, Irdning, Österreich, 27/01/07.

APA

Grießer, T., Höfler, T., Temmel, S., Kern, W., & Trimmel, G. (2007). Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions. Postersitzung präsentiert bei Winterschool on “Interface Controlled and Functionalised Organic Films”, Irdning, Österreich.

Vancouver

Grießer T, Höfler T, Temmel S, Kern W, Trimmel G. Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions. 2007. Postersitzung präsentiert bei Winterschool on “Interface Controlled and Functionalised Organic Films”, Irdning, Österreich.

Author

Grießer, Thomas ; Höfler, Thomas ; Temmel, Susanne et al. / Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions. Postersitzung präsentiert bei Winterschool on “Interface Controlled and Functionalised Organic Films”, Irdning, Österreich.

Bibtex - Download

@conference{9bc671214b574e75a951bfd902e13684,
title = "Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions",
author = "Thomas Grie{\ss}er and Thomas H{\"o}fler and Susanne Temmel and Wolfgang Kern and Gregor Trimmel",
year = "2007",
language = "Deutsch",
note = "Winterschool on “Interface Controlled and Functionalised Organic Films” ; Conference date: 27-01-2007",

}

RIS (suitable for import to EndNote) - Download

TY - CONF

T1 - Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions

AU - Grießer, Thomas

AU - Höfler, Thomas

AU - Temmel, Susanne

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

Y1 - 2007

M3 - Poster

T2 - Winterschool on “Interface Controlled and Functionalised Organic Films”

Y2 - 27 January 2007

ER -