Photo-Fries-based photosensitive polymeric interlayers for patterned organic devices
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
in: Applied physics / A (Series A, Materials science & processing), Jahrgang Juni, 2012, S. 985-993.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
APA
Vancouver
Author
Bibtex - Download
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Photo-Fries-based photosensitive polymeric interlayers for patterned organic devices
AU - Motaigne Ramil, Alberto
AU - Hernandez-Sosa, Gerardo
AU - Grießer, Thomas
AU - Simbrunner, C.
AU - Höfler, Thomas
AU - Trimmel, Gregor
AU - Kern, Wolfgang
AU - Shen, Quan
AU - Teichert, C.
AU - Schwabegger, G.
AU - Sitter, Helmut
AU - Serdar Sriciftci, Niyazi
PY - 2012
Y1 - 2012
M3 - Article
VL - Juni
SP - 985
EP - 993
JO - Applied physics / A (Series A, Materials science & processing)
JF - Applied physics / A (Series A, Materials science & processing)
SN - 0340-3793
ER -