Patterned immobilisation of silicon dioxide nanoparticles on the surface of a photosensitive polymer
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Patterned immobilisation of silicon dioxide nanoparticles on the surface of a photosensitive polymer. / Muhr, Nina; Kern, Wolfgang; Grießer, Thomas.
in: Thin solid films, Jahrgang 520, 2012, S. 1789-1793.
in: Thin solid films, Jahrgang 520, 2012, S. 1789-1793.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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Muhr, N, Kern, W & Grießer, T 2012, 'Patterned immobilisation of silicon dioxide nanoparticles on the surface of a photosensitive polymer', Thin solid films, Jg. 520, S. 1789-1793.
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Bibtex - Download
@article{7200d542f7dd4177945c3cf125a8275a,
title = "Patterned immobilisation of silicon dioxide nanoparticles on the surface of a photosensitive polymer",
author = "Nina Muhr and Wolfgang Kern and Thomas Grie{\ss}er",
year = "2012",
language = "English",
volume = "520",
pages = "1789--1793",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Patterned immobilisation of silicon dioxide nanoparticles on the surface of a photosensitive polymer
AU - Muhr, Nina
AU - Kern, Wolfgang
AU - Grießer, Thomas
PY - 2012
Y1 - 2012
M3 - Article
VL - 520
SP - 1789
EP - 1793
JO - Thin solid films
JF - Thin solid films
SN - 0040-6090
ER -