New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Standard

New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. / Lex, Alexandra; Trimmel, Georg; Kern, Wolfgang et al.
2007. Postersitzung präsentiert bei E-MRS Spring Meeting 2007, Strasbourg, Frankreich.

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Harvard

Lex, A, Trimmel, G, Kern, W, Pacher, P, Schennach, R, Werzer, O, Resel, R, Zojer, E, Koller, G, Shen, Q, Hlawacek, G & Teichert, C 2007, 'New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers', E-MRS Spring Meeting 2007, Strasbourg, Frankreich, 27/05/07 - 31/05/07.

APA

Lex, A., Trimmel, G., Kern, W., Pacher, P., Schennach, R., Werzer, O., Resel, R., Zojer, E., Koller, G., Shen, Q., Hlawacek, G., & Teichert, C. (2007). New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. Postersitzung präsentiert bei E-MRS Spring Meeting 2007, Strasbourg, Frankreich.

Vancouver

Lex A, Trimmel G, Kern W, Pacher P, Schennach R, Werzer O et al.. New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. 2007. Postersitzung präsentiert bei E-MRS Spring Meeting 2007, Strasbourg, Frankreich.

Author

Lex, Alexandra ; Trimmel, Georg ; Kern, Wolfgang et al. / New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. Postersitzung präsentiert bei E-MRS Spring Meeting 2007, Strasbourg, Frankreich.

Bibtex - Download

@conference{236c759b3c7443039dbd6e81b6c04436,
title = "New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers",
author = "Alexandra Lex and Georg Trimmel and Wolfgang Kern and Peter Pacher and Robert Schennach and Oliver Werzer and Roland Resel and Egbert Zojer and Georg Koller and Quan Shen and Gregor Hlawacek and Christian Teichert",
year = "2007",
language = "English",
note = "E-MRS ; Conference date: 27-05-2007 Through 31-05-2007",

}

RIS (suitable for import to EndNote) - Download

TY - CONF

T1 - New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

AU - Lex, Alexandra

AU - Trimmel, Georg

AU - Kern, Wolfgang

AU - Pacher, Peter

AU - Schennach, Robert

AU - Werzer, Oliver

AU - Resel, Roland

AU - Zojer, Egbert

AU - Koller, Georg

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Teichert, Christian

PY - 2007

Y1 - 2007

M3 - Poster

T2 - E-MRS

Y2 - 27 May 2007 through 31 May 2007

ER -