New photosensitive silane molecule for photochemical patterning of thin layers
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Standard
New photosensitive silane molecule for photochemical patterning of thin layers. / Lex, Alexandra; Pacher, Peter; Schennach, Robert et al.
2007. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.
2007. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Harvard
Lex, A, Pacher, P, Schennach, R, Shen, Q, Hlawacek, G, Teichert, C, Werzer, O, Resel, R, Zojer, E, Kern, W & Trimmel, G 2007, 'New photosensitive silane molecule for photochemical patterning of thin layers', NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich, 26/01/08 - 31/01/08.
APA
Lex, A., Pacher, P., Schennach, R., Shen, Q., Hlawacek, G., Teichert, C., Werzer, O., Resel, R., Zojer, E., Kern, W., & Trimmel, G. (2007). New photosensitive silane molecule for photochemical patterning of thin layers. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.
Vancouver
Lex A, Pacher P, Schennach R, Shen Q, Hlawacek G, Teichert C et al.. New photosensitive silane molecule for photochemical patterning of thin layers. 2007. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.
Author
Bibtex - Download
@conference{fe0c1e6d8de54d928dee875a231155ca,
title = "New photosensitive silane molecule for photochemical patterning of thin layers",
author = "Alexandra Lex and Peter Pacher and Robert Schennach and Quan Shen and Gregor Hlawacek and Christian Teichert and Oliver Werzer and Roland Resel and Egbert Zojer and Wolfgang Kern and Georg Trimmel",
year = "2007",
language = "English",
note = "NFN Winter School on Organic Electronics 2008 Planneralm ; Conference date: 26-01-2008 Through 31-01-2008",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - New photosensitive silane molecule for photochemical patterning of thin layers
AU - Lex, Alexandra
AU - Pacher, Peter
AU - Schennach, Robert
AU - Shen, Quan
AU - Hlawacek, Gregor
AU - Teichert, Christian
AU - Werzer, Oliver
AU - Resel, Roland
AU - Zojer, Egbert
AU - Kern, Wolfgang
AU - Trimmel, Georg
PY - 2007
Y1 - 2007
M3 - Poster
T2 - NFN Winter School on Organic Electronics 2008 Planneralm
Y2 - 26 January 2008 through 31 January 2008
ER -
