Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films

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Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films. / Tunes, Matheus A.; Vishnyakov, Vladimir M.
in: Materials and Design, Jahrgang 170.2019, Nr. May, 107692, 09.05.2019.

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Harvard

Tunes, MA & Vishnyakov, VM 2019, 'Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films', Materials and Design, Jg. 170.2019, Nr. May, 107692. https://doi.org/10.1016/j.matdes.2019.107692

APA

Tunes, M. A., & Vishnyakov, V. M. (2019). Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films. Materials and Design, 170.2019(May), Artikel 107692. https://doi.org/10.1016/j.matdes.2019.107692

Vancouver

Tunes MA, Vishnyakov VM. Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films. Materials and Design. 2019 Mai 9;170.2019(May):107692. doi: 10.1016/j.matdes.2019.107692

Author

Tunes, Matheus A. ; Vishnyakov, Vladimir M. / Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films. in: Materials and Design. 2019 ; Jahrgang 170.2019, Nr. May.

Bibtex - Download

@article{45d93ea2ef2d466c89fff3d77439470d,
title = "Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films",
keywords = "Energy filtered transmission electron microscopy, Nanoindentation, Nanoscratching, Refractory high-entropy alloys, Thin films, Transmission electron microscopy",
author = "Tunes, {Matheus A.} and Vishnyakov, {Vladimir M.}",
year = "2019",
month = may,
day = "9",
doi = "10.1016/j.matdes.2019.107692",
language = "English",
volume = "170.2019",
journal = "Materials and Design",
issn = "0264-1275",
publisher = "Elsevier",
number = "May",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films

AU - Tunes, Matheus A.

AU - Vishnyakov, Vladimir M.

PY - 2019/5/9

Y1 - 2019/5/9

KW - Energy filtered transmission electron microscopy

KW - Nanoindentation

KW - Nanoscratching

KW - Refractory high-entropy alloys

KW - Thin films

KW - Transmission electron microscopy

UR - http://www.scopus.com/inward/record.url?scp=85063885293&partnerID=8YFLogxK

U2 - 10.1016/j.matdes.2019.107692

DO - 10.1016/j.matdes.2019.107692

M3 - Article

AN - SCOPUS:85063885293

VL - 170.2019

JO - Materials and Design

JF - Materials and Design

SN - 0264-1275

IS - May

M1 - 107692

ER -

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