Investigation of chemically and photochemically reactive siloxane thin layers for surface modification

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Standard

Investigation of chemically and photochemically reactive siloxane thin layers for surface modification. / Lex, Alexandra; Pacher, Peter; Shen, Quan et al.
2008. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.

Publikationen: KonferenzbeitragPosterForschung(peer-reviewed)

Harvard

Lex, A, Pacher, P, Shen, Q, Temmel, S, Hlawacek, G, Werzer, O, Track, AM, Frank, P, Proschek, V, Schennach, R, Koller, G, Ramsey, MG, Teichert, C, Resel, R, Winkler, A & Zojer, E 2008, 'Investigation of chemically and photochemically reactive siloxane thin layers for surface modification', NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich, 26/01/08 - 31/01/08.

APA

Lex, A., Pacher, P., Shen, Q., Temmel, S., Hlawacek, G., Werzer, O., Track, A. M., Frank, P., Proschek, V., Schennach, R., Koller, G., Ramsey, M. G., Teichert, C., Resel, R., Winkler, A., & Zojer, E. (2008). Investigation of chemically and photochemically reactive siloxane thin layers for surface modification. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.

Vancouver

Lex A, Pacher P, Shen Q, Temmel S, Hlawacek G, Werzer O et al.. Investigation of chemically and photochemically reactive siloxane thin layers for surface modification. 2008. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.

Author

Lex, Alexandra ; Pacher, Peter ; Shen, Quan et al. / Investigation of chemically and photochemically reactive siloxane thin layers for surface modification. Postersitzung präsentiert bei NFN Winter School on Organic Electronics 2008 Planneralm, Donnersbach, Österreich.

Bibtex - Download

@conference{5861666682b04557a7db8e026af16bd3,
title = "Investigation of chemically and photochemically reactive siloxane thin layers for surface modification",
author = "Alexandra Lex and Peter Pacher and Quan Shen and Susanne Temmel and Gregor Hlawacek and Oliver Werzer and Track, {Anna M.} and Paul Frank and Veronika Proschek and Robert Schennach and Georg Koller and Ramsey, {Michael G.} and Christian Teichert and Roland Resel and Adolf Winkler and Egbert Zojer",
year = "2008",
language = "English",
note = "NFN Winter School on Organic Electronics 2008 Planneralm ; Conference date: 26-01-2008 Through 31-01-2008",

}

RIS (suitable for import to EndNote) - Download

TY - CONF

T1 - Investigation of chemically and photochemically reactive siloxane thin layers for surface modification

AU - Lex, Alexandra

AU - Pacher, Peter

AU - Shen, Quan

AU - Temmel, Susanne

AU - Hlawacek, Gregor

AU - Werzer, Oliver

AU - Track, Anna M.

AU - Frank, Paul

AU - Proschek, Veronika

AU - Schennach, Robert

AU - Koller, Georg

AU - Ramsey, Michael G.

AU - Teichert, Christian

AU - Resel, Roland

AU - Winkler, Adolf

AU - Zojer, Egbert

PY - 2008

Y1 - 2008

M3 - Poster

T2 - NFN Winter School on Organic Electronics 2008 Planneralm

Y2 - 26 January 2008 through 31 January 2008

ER -