Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films

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Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films. / Rashid, Saqib; Sebastiani, Marco; Mughal, Muhammed Zeeshan et al.
in: Nanomaterials, Jahrgang 11.2021, Nr. 2, 435, 09.02.2021.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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APA

Rashid, S., Sebastiani, M., Mughal, M. Z., Daniel, R., & Bemporad, E. (2021). Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films. Nanomaterials, 11.2021(2), Artikel 435. https://doi.org/10.3390/nano11020435

Vancouver

Rashid S, Sebastiani M, Mughal MZ, Daniel R, Bemporad E. Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films. Nanomaterials. 2021 Feb 9;11.2021(2):435. doi: 10.3390/nano11020435

Author

Rashid, Saqib ; Sebastiani, Marco ; Mughal, Muhammed Zeeshan et al. / Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films. in: Nanomaterials. 2021 ; Jahrgang 11.2021, Nr. 2.

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@article{1a9daee40e60435a97d334f1545786dd,
title = "Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films",
abstract = "In this work, the ternary titanium, copper, and silver (Ti-Cu-Ag) system is investigated as a potential candidate for the production of mechanically robust biomedical thin films. The coatings are produced by physical vapor deposition—magnetron sputtering (MS-PVD). The composite thin films are deposited on a silicon (100) substrate. The ratio between Ti and Cu was approximately kept one, with the variation of the Ag content between 10 and 35 at.%, while the power on the targets is changed during each deposition to get the desired Ag content. Thin film characterization is performed by X-ray diffraction (XRD), nanoindentation (modulus and hardness), to quantitatively evaluate the scratch adhesion, and atomic force microscopy to determine the surface topography. The residual stresses are measured by focused ion beam and digital image correlation method (FIB-DIC). The produced Ti-Cu-Ag thin films appear to be smooth, uniformly thick, and exhibit amorphous structure for the Ag contents lower than 25 at.%, with a transition to partially crystalline structure for higher Ag concentrations. The Ti-Cu control film shows higher values of 124.5 GPa and 7.85 GPa for modulus and hardness, respectively. There is a clear trend of continuous decrease in the modulus and hardness with the increase of Ag content, as lowest value of 105.5 GPa and 6 GPa for 35 at.% Ag containing thin films. In particular, a transition from the compressive (−36.5 MPa) to tensile residual stresses between 229 MPa and 288 MPa are observed with an increasing Ag content. The obtained results suggest that the Ag concentration should not exceed 25 at.%, in order to avoid an excessive reduction of the modulus and hardness with maintaining (at the same time) the potential for an increase of the antibacterial properties. In summary, Ti-Cu-Ag thin films shows characteristic mechanical properties that can be used to improve the properties of biomedical implants such as Ti-alloys and stainless steel.",
author = "Saqib Rashid and Marco Sebastiani and Mughal, {Muhammed Zeeshan} and Rostislav Daniel and Edoardo Bemporad",
note = "Publisher Copyright: {\textcopyright} 2021 by the authors. Licensee MDPI, Basel, Switzerland.",
year = "2021",
month = feb,
day = "9",
doi = "10.3390/nano11020435",
language = "English",
volume = "11.2021",
journal = "Nanomaterials",
issn = "2079-4991",
publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",
number = "2",

}

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TY - JOUR

T1 - Influence of the Silver Content on Mechanical Properties of Ti-Cu-Ag Thin Films

AU - Rashid, Saqib

AU - Sebastiani, Marco

AU - Mughal, Muhammed Zeeshan

AU - Daniel, Rostislav

AU - Bemporad, Edoardo

N1 - Publisher Copyright: © 2021 by the authors. Licensee MDPI, Basel, Switzerland.

PY - 2021/2/9

Y1 - 2021/2/9

N2 - In this work, the ternary titanium, copper, and silver (Ti-Cu-Ag) system is investigated as a potential candidate for the production of mechanically robust biomedical thin films. The coatings are produced by physical vapor deposition—magnetron sputtering (MS-PVD). The composite thin films are deposited on a silicon (100) substrate. The ratio between Ti and Cu was approximately kept one, with the variation of the Ag content between 10 and 35 at.%, while the power on the targets is changed during each deposition to get the desired Ag content. Thin film characterization is performed by X-ray diffraction (XRD), nanoindentation (modulus and hardness), to quantitatively evaluate the scratch adhesion, and atomic force microscopy to determine the surface topography. The residual stresses are measured by focused ion beam and digital image correlation method (FIB-DIC). The produced Ti-Cu-Ag thin films appear to be smooth, uniformly thick, and exhibit amorphous structure for the Ag contents lower than 25 at.%, with a transition to partially crystalline structure for higher Ag concentrations. The Ti-Cu control film shows higher values of 124.5 GPa and 7.85 GPa for modulus and hardness, respectively. There is a clear trend of continuous decrease in the modulus and hardness with the increase of Ag content, as lowest value of 105.5 GPa and 6 GPa for 35 at.% Ag containing thin films. In particular, a transition from the compressive (−36.5 MPa) to tensile residual stresses between 229 MPa and 288 MPa are observed with an increasing Ag content. The obtained results suggest that the Ag concentration should not exceed 25 at.%, in order to avoid an excessive reduction of the modulus and hardness with maintaining (at the same time) the potential for an increase of the antibacterial properties. In summary, Ti-Cu-Ag thin films shows characteristic mechanical properties that can be used to improve the properties of biomedical implants such as Ti-alloys and stainless steel.

AB - In this work, the ternary titanium, copper, and silver (Ti-Cu-Ag) system is investigated as a potential candidate for the production of mechanically robust biomedical thin films. The coatings are produced by physical vapor deposition—magnetron sputtering (MS-PVD). The composite thin films are deposited on a silicon (100) substrate. The ratio between Ti and Cu was approximately kept one, with the variation of the Ag content between 10 and 35 at.%, while the power on the targets is changed during each deposition to get the desired Ag content. Thin film characterization is performed by X-ray diffraction (XRD), nanoindentation (modulus and hardness), to quantitatively evaluate the scratch adhesion, and atomic force microscopy to determine the surface topography. The residual stresses are measured by focused ion beam and digital image correlation method (FIB-DIC). The produced Ti-Cu-Ag thin films appear to be smooth, uniformly thick, and exhibit amorphous structure for the Ag contents lower than 25 at.%, with a transition to partially crystalline structure for higher Ag concentrations. The Ti-Cu control film shows higher values of 124.5 GPa and 7.85 GPa for modulus and hardness, respectively. There is a clear trend of continuous decrease in the modulus and hardness with the increase of Ag content, as lowest value of 105.5 GPa and 6 GPa for 35 at.% Ag containing thin films. In particular, a transition from the compressive (−36.5 MPa) to tensile residual stresses between 229 MPa and 288 MPa are observed with an increasing Ag content. The obtained results suggest that the Ag concentration should not exceed 25 at.%, in order to avoid an excessive reduction of the modulus and hardness with maintaining (at the same time) the potential for an increase of the antibacterial properties. In summary, Ti-Cu-Ag thin films shows characteristic mechanical properties that can be used to improve the properties of biomedical implants such as Ti-alloys and stainless steel.

UR - http://www.scopus.com/inward/record.url?scp=85100544999&partnerID=8YFLogxK

U2 - 10.3390/nano11020435

DO - 10.3390/nano11020435

M3 - Article

VL - 11.2021

JO - Nanomaterials

JF - Nanomaterials

SN - 2079-4991

IS - 2

M1 - 435

ER -