Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films

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Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films. / Xia, Ao; Dedoncker, Robin; Glushko, Oleksandr et al.
in: Journal of alloys and compounds, Jahrgang 850.2021, Nr. 5 January, 156740, 20.08.2020.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Vancouver

Xia A, Dedoncker R, Glushko O, Cordill MJ, Depla D, Franz R. Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films. Journal of alloys and compounds. 2020 Aug 20;850.2021(5 January):156740. Epub 2020 Aug 20. doi: 10.1016/j.jallcom.2020.156740

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@article{eac3cacd8d404f11b36ecf7c6e1708c2,
title = "Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films",
abstract = "The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW) 1−xN x high entropy alloy thin films is investigated. The films were synthesized by two different physical vapor deposition methods, cathodic arc deposition and direct current magnetron sputtering, onto silicon and polyimide substrates. Regardless of the deposition method, a change from body centered cubic to face centered cubic structure was observed with increasing nitrogen content in the film. This structural change was accompanied by an increase in hardness as measured by nanoindentation but also by a material embrittlement as determined from tensile straining tests. ",
author = "Ao Xia and Robin Dedoncker and Oleksandr Glushko and Cordill, {Megan J.} and Diederik Depla and Robert Franz",
note = "Publisher Copyright: {\textcopyright} 2020 Elsevier B.V.",
year = "2020",
month = aug,
day = "20",
doi = "10.1016/j.jallcom.2020.156740",
language = "English",
volume = "850.2021",
journal = "Journal of alloys and compounds",
issn = "0925-8388",
publisher = "Elsevier",
number = "5 January",

}

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TY - JOUR

T1 - Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films

AU - Xia, Ao

AU - Dedoncker, Robin

AU - Glushko, Oleksandr

AU - Cordill, Megan J.

AU - Depla, Diederik

AU - Franz, Robert

N1 - Publisher Copyright: © 2020 Elsevier B.V.

PY - 2020/8/20

Y1 - 2020/8/20

N2 - The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW) 1−xN x high entropy alloy thin films is investigated. The films were synthesized by two different physical vapor deposition methods, cathodic arc deposition and direct current magnetron sputtering, onto silicon and polyimide substrates. Regardless of the deposition method, a change from body centered cubic to face centered cubic structure was observed with increasing nitrogen content in the film. This structural change was accompanied by an increase in hardness as measured by nanoindentation but also by a material embrittlement as determined from tensile straining tests.

AB - The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW) 1−xN x high entropy alloy thin films is investigated. The films were synthesized by two different physical vapor deposition methods, cathodic arc deposition and direct current magnetron sputtering, onto silicon and polyimide substrates. Regardless of the deposition method, a change from body centered cubic to face centered cubic structure was observed with increasing nitrogen content in the film. This structural change was accompanied by an increase in hardness as measured by nanoindentation but also by a material embrittlement as determined from tensile straining tests.

UR - http://www.scopus.com/inward/record.url?scp=85089753678&partnerID=8YFLogxK

U2 - 10.1016/j.jallcom.2020.156740

DO - 10.1016/j.jallcom.2020.156740

M3 - Article

VL - 850.2021

JO - Journal of alloys and compounds

JF - Journal of alloys and compounds

SN - 0925-8388

IS - 5 January

M1 - 156740

ER -