Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Standard

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces. / Wrana, Dominik; Kratzer, Markus; Szajna, Konrad et al.
in: Journal of physical chemistry C (C, Nanomaterials and interfaces), Jahrgang 119, Nr. 29, 23.07.2015, S. 17004-17015.

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Harvard

Wrana, D, Kratzer, M, Szajna, K, Nikiel, M, Jany, BR, Korzekwa, M, Teichert, C & Krok, F 2015, 'Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces', Journal of physical chemistry C (C, Nanomaterials and interfaces), Jg. 119, Nr. 29, S. 17004-17015. https://doi.org/10.1021/acs.jpcc.5b04384

APA

Wrana, D., Kratzer, M., Szajna, K., Nikiel, M., Jany, B. R., Korzekwa, M., Teichert, C., & Krok, F. (2015). Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces. Journal of physical chemistry C (C, Nanomaterials and interfaces), 119(29), 17004-17015. https://doi.org/10.1021/acs.jpcc.5b04384

Vancouver

Wrana D, Kratzer M, Szajna K, Nikiel M, Jany BR, Korzekwa M et al. Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces. Journal of physical chemistry C (C, Nanomaterials and interfaces). 2015 Jul 23;119(29):17004-17015. doi: 10.1021/acs.jpcc.5b04384

Author

Wrana, Dominik ; Kratzer, Markus ; Szajna, Konrad et al. / Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces. in: Journal of physical chemistry C (C, Nanomaterials and interfaces). 2015 ; Jahrgang 119, Nr. 29. S. 17004-17015.

Bibtex - Download

@article{6beb70bfa34843b0953b58c937ced84c,
title = "Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces",
author = "Dominik Wrana and Markus Kratzer and Konrad Szajna and Marek Nikiel and Jany, {Benedykt R.} and Marcin Korzekwa and Christian Teichert and Franciszek Krok",
year = "2015",
month = jul,
day = "23",
doi = "10.1021/acs.jpcc.5b04384",
language = "English",
volume = "119",
pages = "17004--17015",
journal = "Journal of physical chemistry C (C, Nanomaterials and interfaces)",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "29",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

AU - Wrana, Dominik

AU - Kratzer, Markus

AU - Szajna, Konrad

AU - Nikiel, Marek

AU - Jany, Benedykt R.

AU - Korzekwa, Marcin

AU - Teichert, Christian

AU - Krok, Franciszek

PY - 2015/7/23

Y1 - 2015/7/23

U2 - 10.1021/acs.jpcc.5b04384

DO - 10.1021/acs.jpcc.5b04384

M3 - Article

VL - 119

SP - 17004

EP - 17015

JO - Journal of physical chemistry C (C, Nanomaterials and interfaces)

JF - Journal of physical chemistry C (C, Nanomaterials and interfaces)

SN - 1932-7447

IS - 29

ER -

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