Fabrication of ion bombardment induced rippled TiO2 surfaces to influence subsequent organic thin film growth

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Fabrication of ion bombardment induced rippled TiO2 surfaces to influence subsequent organic thin film growth. / Kratzer, M.; Szajna, K.; Wrana, D. et al.
in: Journal of Physics Condensed Matter, Jahrgang 30, Nr. 28, 283001, 18.06.2018.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Bibtex - Download

@article{f8e16f26140249b7b4e28308bba23d7e,
title = "Fabrication of ion bombardment induced rippled TiO2 surfaces to influence subsequent organic thin film growth",
keywords = "ion-bombardment, nanopatterning, organic thin film, para-hexaphenyl, ripple structure, TiO",
author = "M. Kratzer and K. Szajna and D. Wrana and W. Belza and F. Krok and C. Teichert",
year = "2018",
month = jun,
day = "18",
doi = "10.1088/1361-648X/aac758",
language = "English",
volume = "30",
journal = "Journal of Physics Condensed Matter",
issn = "0953-8984",
publisher = "IOP Publishing Ltd.",
number = "28",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Fabrication of ion bombardment induced rippled TiO2 surfaces to influence subsequent organic thin film growth

AU - Kratzer, M.

AU - Szajna, K.

AU - Wrana, D.

AU - Belza, W.

AU - Krok, F.

AU - Teichert, C.

PY - 2018/6/18

Y1 - 2018/6/18

KW - ion-bombardment

KW - nanopatterning

KW - organic thin film

KW - para-hexaphenyl

KW - ripple structure

KW - TiO

UR - http://www.scopus.com/inward/record.url?scp=85049230558&partnerID=8YFLogxK

U2 - 10.1088/1361-648X/aac758

DO - 10.1088/1361-648X/aac758

M3 - Article

AN - SCOPUS:85049230558

VL - 30

JO - Journal of Physics Condensed Matter

JF - Journal of Physics Condensed Matter

SN - 0953-8984

IS - 28

M1 - 283001

ER -