Fabrication of Amorphous Silicon-Carbon Hybrid Films using Single Source Precursors
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in: Inorganic chemistry, Jahrgang 62.2023, Nr. 38, 12.09.2023, S. 15490-15501.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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TY - JOUR
T1 - Fabrication of Amorphous Silicon-Carbon Hybrid Films using Single Source Precursors
AU - Sauermoser, Aileen
AU - Lainer, Thomas
AU - Bandl, Christine
AU - Haas, Michael
AU - Knoechl, Andreas
AU - Goni, Freskida
AU - Fischer, Roland
AU - Fitzek, Harald
AU - Dienstleder, Martina
AU - Prietl, Christine
AU - Kelterer, Anne Marie
AU - Bandl, Christine
AU - Jakopic, Georg
AU - Kothleitner, Gerald
AU - Haas, Michael
PY - 2023/9/12
Y1 - 2023/9/12
N2 - The aim of this study was the preparation of different amorphous silicon–carbon hybrid thin-layer materials according to the liquid phase deposition (LPD) process using single-source precursors. In our study, 2-methyl-2-silyltrisilane (methylisotetrasilane; 2), 1,1,1-trimethyl-2,2-disilyltrisilane (trimethylsilylisotetrasilane; 3), 2-phenyl-2-silyltrisilane (phenylisotetrasilane; 4), and 1,1,2,2,4,4,5,5-octamethyl-3,3,6,6-tetrasilylcyclohexasilane (cyclohexasilane; 5) were utilized as precursor materials and compared with the parent compound 2,2-disilyltrisilane (neopentasilane; 1). Compounds 2–5 were successfully oligomerized at λ = 365 nm with catalytic amounts of the neopentasilane oligomer (NPO). These oligomeric mixtures (NPO and 6–9) were used for the preparation of thin-layer materials. Optimum solution and spin coating conditions were investigated, and amorphous silicon–carbon films were obtained. All thin-layer materials were characterized via UV/vis spectroscopy, light microscopy, spectroscopic ellipsometry, XPS, SEM, and SEM/EDX. Our results show that the carbon content and especially the bandgap can be easily tuned using these single-source precursors via LPD.
AB - The aim of this study was the preparation of different amorphous silicon–carbon hybrid thin-layer materials according to the liquid phase deposition (LPD) process using single-source precursors. In our study, 2-methyl-2-silyltrisilane (methylisotetrasilane; 2), 1,1,1-trimethyl-2,2-disilyltrisilane (trimethylsilylisotetrasilane; 3), 2-phenyl-2-silyltrisilane (phenylisotetrasilane; 4), and 1,1,2,2,4,4,5,5-octamethyl-3,3,6,6-tetrasilylcyclohexasilane (cyclohexasilane; 5) were utilized as precursor materials and compared with the parent compound 2,2-disilyltrisilane (neopentasilane; 1). Compounds 2–5 were successfully oligomerized at λ = 365 nm with catalytic amounts of the neopentasilane oligomer (NPO). These oligomeric mixtures (NPO and 6–9) were used for the preparation of thin-layer materials. Optimum solution and spin coating conditions were investigated, and amorphous silicon–carbon films were obtained. All thin-layer materials were characterized via UV/vis spectroscopy, light microscopy, spectroscopic ellipsometry, XPS, SEM, and SEM/EDX. Our results show that the carbon content and especially the bandgap can be easily tuned using these single-source precursors via LPD.
U2 - 10.1021/acs.inorgchem.3c01846
DO - 10.1021/acs.inorgchem.3c01846
M3 - Article
VL - 62.2023
SP - 15490
EP - 15501
JO - Inorganic chemistry
JF - Inorganic chemistry
SN - 0020-1669
IS - 38
ER -
