Chemical sensitivity on patterned organic thin films by FFM
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Standard
Chemical sensitivity on patterned organic thin films by FFM. / Shen, Quan; Hlawacek, Gregor; Teichert, Christian et al.
2008. Postersitzung präsentiert bei E-MRS 2008 Spring Meeting, Strasbourg, France.
2008. Postersitzung präsentiert bei E-MRS 2008 Spring Meeting, Strasbourg, France.
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Harvard
Shen, Q, Hlawacek, G, Teichert, C, Lex, A, Trimmel, G & Kern, W 2008, 'Chemical sensitivity on patterned organic thin films by FFM', E-MRS 2008 Spring Meeting, Strasbourg, France, 26/05/08 - 30/05/08.
APA
Shen, Q., Hlawacek, G., Teichert, C., Lex, A., Trimmel, G., & Kern, W. (2008). Chemical sensitivity on patterned organic thin films by FFM. Postersitzung präsentiert bei E-MRS 2008 Spring Meeting, Strasbourg, France.
Vancouver
Shen Q, Hlawacek G, Teichert C, Lex A, Trimmel G, Kern W. Chemical sensitivity on patterned organic thin films by FFM. 2008. Postersitzung präsentiert bei E-MRS 2008 Spring Meeting, Strasbourg, France.
Author
Bibtex - Download
@conference{ea09d4a4c00b43ef9efe0d9beee564c9,
title = "Chemical sensitivity on patterned organic thin films by FFM",
author = "Quan Shen and Gregor Hlawacek and Christian Teichert and Alexandra Lex and Georg Trimmel and Wolfgang Kern",
year = "2008",
language = "English",
note = "E-MRS 2008 Spring Meeting ; Conference date: 26-05-2008 Through 30-05-2008",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - Chemical sensitivity on patterned organic thin films by FFM
AU - Shen, Quan
AU - Hlawacek, Gregor
AU - Teichert, Christian
AU - Lex, Alexandra
AU - Trimmel, Georg
AU - Kern, Wolfgang
PY - 2008
Y1 - 2008
M3 - Poster
T2 - E-MRS 2008 Spring Meeting
Y2 - 26 May 2008 through 30 May 2008
ER -
