Atomistic Modelling of Optical Properties of Thin Films
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Atomistic Modelling of Optical Properties of Thin Films. / Puschnig, Peter; Ambrosch-Draxl, Claudia.
in: Advanced engineering materials, Jahrgang 8, 2006, S. 1151-1155.
in: Advanced engineering materials, Jahrgang 8, 2006, S. 1151-1155.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Puschnig, P & Ambrosch-Draxl, C 2006, 'Atomistic Modelling of Optical Properties of Thin Films', Advanced engineering materials, Jg. 8, S. 1151-1155.
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Bibtex - Download
@article{67ac0cd3abca499cb439ec587fee4b31,
title = "Atomistic Modelling of Optical Properties of Thin Films",
author = "Peter Puschnig and Claudia Ambrosch-Draxl",
year = "2006",
language = "English",
volume = "8",
pages = "1151--1155",
journal = " Advanced engineering materials",
issn = "1438-1656",
publisher = "Wiley-VCH ",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Atomistic Modelling of Optical Properties of Thin Films
AU - Puschnig, Peter
AU - Ambrosch-Draxl, Claudia
PY - 2006
Y1 - 2006
M3 - Article
VL - 8
SP - 1151
EP - 1155
JO - Advanced engineering materials
JF - Advanced engineering materials
SN - 1438-1656
ER -
