TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography

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TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography. / Mühlbacher, Marlene; Greczynski, Grzegorz; Sartory, Bernhard et al.
In: Journal of Vacuum Science and Technology B, JVSTB, Vol. 34.2016, No. 2, 022202, 19.02.2016, p. 1-8.

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@article{e3b51d6372534cc7b02502f3ebc737a0,
title = "TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography",
author = "Marlene M{\"u}hlbacher and Grzegorz Greczynski and Bernhard Sartory and {Mendez Martin}, Francisca and Nina Schalk and Jun Lu and Lars Hultman and Christian Mitterer",
year = "2016",
month = feb,
day = "19",
doi = "10.1116/1.4942003",
language = "English",
volume = "34.2016",
pages = "1--8",
journal = "Journal of Vacuum Science and Technology B, JVSTB",
issn = "2166-2746",
publisher = "AVS Science and Technology Society",
number = "2",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography

AU - Mühlbacher, Marlene

AU - Greczynski, Grzegorz

AU - Sartory, Bernhard

AU - Mendez Martin, Francisca

AU - Schalk, Nina

AU - Lu, Jun

AU - Hultman, Lars

AU - Mitterer, Christian

PY - 2016/2/19

Y1 - 2016/2/19

U2 - 10.1116/1.4942003

DO - 10.1116/1.4942003

M3 - Article

VL - 34.2016

SP - 1

EP - 8

JO - Journal of Vacuum Science and Technology B, JVSTB

JF - Journal of Vacuum Science and Technology B, JVSTB

SN - 2166-2746

IS - 2

M1 - 022202

ER -