Thermal stability of MoNbTaTiW, MoNbTaVW and CrMoNbTaW thin films deposited by high power impulse magnetron sputtering

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Alice Lassnig
  • Stanislav Žák
  • Christoph Gammer
  • Megan Cordill

External Organisational units

  • Erich Schmid Institute of Materials Science

Abstract

With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 °C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin 2Ψ method revealed a general reduction of the stress with annealing temperature due to defect annihilation.

Details

Original languageEnglish
Article number129189
Number of pages7
JournalSurface & coatings technology
Volume454.2023
Issue number15 February
Early online date23 Dec 2022
DOIs
Publication statusPublished - 15 Feb 2023