Thermal stability of MoNbTaTiW, MoNbTaVW and CrMoNbTaW thin films deposited by high power impulse magnetron sputtering
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Authors
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- Erich Schmid Institute of Materials Science
Abstract
With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 °C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin 2Ψ method revealed a general reduction of the stress with annealing temperature due to defect annihilation.
Details
Original language | English |
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Article number | 129189 |
Number of pages | 7 |
Journal | Surface & coatings technology |
Volume | 454.2023 |
Issue number | 15 February |
Early online date | 23 Dec 2022 |
DOIs | |
Publication status | Published - 15 Feb 2023 |