Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography
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In: Journal of vacuum science & technology / B (JVST), Vol. 21, 2003, p. 123-126.
Research output: Contribution to journal › Article › Research › peer-review
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TY - JOUR
T1 - Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography
AU - Braun, D.
AU - Gajic, Rados
AU - Kuchar, Friedemar
AU - Korntner, Regina
AU - Haugeneder, E.
AU - Löschner, H.
AU - Butschke, J.
AU - Letzkus, F.
AU - Springer, R.
PY - 2003
Y1 - 2003
M3 - Article
VL - 21
SP - 123
EP - 126
JO - Journal of vacuum science & technology / B (JVST)
JF - Journal of vacuum science & technology / B (JVST)
SN - 0734-211X
ER -