Structure and properties of sputter deposited crystalline and amorphous Cu-Ti films

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Structure and properties of sputter deposited crystalline and amorphous Cu-Ti films. / Turnow, H.; Wendrock, H.; Menzel, S. et al.
In: Thin solid films, Vol. 598, 01.01.2016, p. 184-188.

Research output: Contribution to journalArticleResearchpeer-review

Vancouver

Turnow H, Wendrock H, Menzel S, Gemming T, Eckert J. Structure and properties of sputter deposited crystalline and amorphous Cu-Ti films. Thin solid films. 2016 Jan 1;598:184-188. doi: 10.1016/j.tsf.2015.10.081

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Turnow, H. ; Wendrock, H. ; Menzel, S. et al. / Structure and properties of sputter deposited crystalline and amorphous Cu-Ti films. In: Thin solid films. 2016 ; Vol. 598. pp. 184-188.

Bibtex - Download

@article{356a9ebaaae5494c9dca378386b37d51,
title = "Structure and properties of sputter deposited crystalline and amorphous Cu-Ti films",
keywords = "Amorphous, Cu-Ti, Intrinsic stress, Sputtering, Thin film",
author = "H. Turnow and H. Wendrock and S. Menzel and T. Gemming and J. Eckert",
year = "2016",
month = jan,
day = "1",
doi = "10.1016/j.tsf.2015.10.081",
language = "English",
volume = "598",
pages = "184--188",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Structure and properties of sputter deposited crystalline and amorphous Cu-Ti films

AU - Turnow, H.

AU - Wendrock, H.

AU - Menzel, S.

AU - Gemming, T.

AU - Eckert, J.

PY - 2016/1/1

Y1 - 2016/1/1

KW - Amorphous

KW - Cu-Ti

KW - Intrinsic stress

KW - Sputtering

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=84959105019&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2015.10.081

DO - 10.1016/j.tsf.2015.10.081

M3 - Article

AN - SCOPUS:84959105019

VL - 598

SP - 184

EP - 188

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

ER -