TY - JOUR

T1 - Sputter deposited silver niobate thin films: Pathway towards phase purity

AU - Kölbl, Lukas

AU - Kobald, Alexander

AU - Griesser, Thomas

AU - Munnik, Frans

AU - Mitterer, Christian

N1 - Publisher Copyright: © 2024 The Author(s)

PY - 2024/9/15

Y1 - 2024/9/15

N2 - The quest for environmentally sustainable alternatives to lead-based dielectric materials in dielectric capacitors has led research to the exploration of options such as silver niobate (AgNbO 3), which has been found to display excellent energy storage properties. Homogeneity and phase-purity of the used thin films are vital for optimal performance of these devices. In this study, a systematic variation of oxygen partial pressure and bias voltage during reactive d.c. magnetron co-sputtering from metallic targets is employed to synthesise AgNbO 3 thin films. Structural and chemical composition of the films are investigated using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, elastic recoil detection analysis, and Rutherford backscattering spectrometry. The findings emphasise the necessity of precise parameter control during deposition to avoid the presence of undesirable secondary phases like Ag and Ag 2Nb 4O 11 and to ensure the formation of homogeneous and phase-pure AgNbO 3 thin films. The gained insights demonstrate the potential of reactive d.c. magnetron sputtering for the deposition of lead-free AgNbO 3 thin films, offering pathways for enhanced environmental compatibility of future dielectric capacitors.

AB - The quest for environmentally sustainable alternatives to lead-based dielectric materials in dielectric capacitors has led research to the exploration of options such as silver niobate (AgNbO 3), which has been found to display excellent energy storage properties. Homogeneity and phase-purity of the used thin films are vital for optimal performance of these devices. In this study, a systematic variation of oxygen partial pressure and bias voltage during reactive d.c. magnetron co-sputtering from metallic targets is employed to synthesise AgNbO 3 thin films. Structural and chemical composition of the films are investigated using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, elastic recoil detection analysis, and Rutherford backscattering spectrometry. The findings emphasise the necessity of precise parameter control during deposition to avoid the presence of undesirable secondary phases like Ag and Ag 2Nb 4O 11 and to ensure the formation of homogeneous and phase-pure AgNbO 3 thin films. The gained insights demonstrate the potential of reactive d.c. magnetron sputtering for the deposition of lead-free AgNbO 3 thin films, offering pathways for enhanced environmental compatibility of future dielectric capacitors.

KW - Energy storage

KW - Magnetron sputtering

KW - Silver niobate

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=85201857063&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2024.140505

DO - 10.1016/j.tsf.2024.140505

M3 - Article

VL - 804.2024

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

IS - 15 September

M1 - 140505

ER -