Organic materials gain importance in semiconductor technology and have been used for various applications in recent years (e.g., transistors based on conductive polymers, organic light emitting diodes, and solar cells). A major reason for this is the possibility to fabricate organic materials (especially organic thin films) with metallic, semiconductive, and isolating properties. In this work, two different kinds of organic thin films have been investigated utilizing atomic force microscopy (AFM) based methods. A polyaniline derivative, fabricated via formylation with subsequent separation of the formyl-group, was illuminated through a mask with micrometer structures. The consecutive exposure to hydrochloric acid vapor resulted in conductive, p-doped areas in the illuminated regions. Utilizing conductive atomic force microscopy (C-AFM), an increased conductivity in the formerly illuminated areas could be demonstrated. Additionally, a work function difference between the illuminated and non-illuminated regions was verified using Kelvin probe force microscopy (KPFM). Using friction force microscopy (FFM), which also operates in contact-mode, like C-AFM, a qualitative increase in the friction coefficient of the illuminated areas was observed. The obtained results were always correlated to the simultaneously measured surface topography. Furthermore, topographical images of a sample fabricated via two photon absorption (TPA) were measured in the so called tapping-mode. There, stepped polymer cones with 0.4 µm step height, becoming more flat towards the cone top were observed. The three dimensional shape of the structures could be quantified.