Photonic superlattice multilayers for EUV lithography infrastructure

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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Photonic superlattice multilayers for EUV lithography infrastructure. / Kuchar, F.; Meisels, R.
34th European Mask and Lithography Conference. Vol. 10775 SPIE, 2018. 1077503.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Harvard

Kuchar, F & Meisels, R 2018, Photonic superlattice multilayers for EUV lithography infrastructure. in 34th European Mask and Lithography Conference. vol. 10775, 1077503, SPIE, 34th European Mask and Lithography Conference, EMLC 2018, Grenoble, France, 18/06/18. https://doi.org/10.1117/12.2322410

APA

Kuchar, F., & Meisels, R. (2018). Photonic superlattice multilayers for EUV lithography infrastructure. In 34th European Mask and Lithography Conference (Vol. 10775). Article 1077503 SPIE. https://doi.org/10.1117/12.2322410

Vancouver

Kuchar F, Meisels R. Photonic superlattice multilayers for EUV lithography infrastructure. In 34th European Mask and Lithography Conference. Vol. 10775. SPIE. 2018. 1077503 doi: 10.1117/12.2322410

Author

Kuchar, F. ; Meisels, R. / Photonic superlattice multilayers for EUV lithography infrastructure. 34th European Mask and Lithography Conference. Vol. 10775 SPIE, 2018.

Bibtex - Download

@inproceedings{cd33f84fe6e04572a672effe5f444b5a,
title = "Photonic superlattice multilayers for EUV lithography infrastructure",
keywords = "Bragg reflectors, Extreme ultraviolet, Photonic crystals, Superlattices",
author = "F. Kuchar and R. Meisels",
year = "2018",
month = jan,
day = "1",
doi = "10.1117/12.2322410",
language = "English",
isbn = "9781510621213",
volume = "10775",
booktitle = "34th European Mask and Lithography Conference",
publisher = "SPIE",
address = "United States",
note = "34th European Mask and Lithography Conference, EMLC 2018 ; Conference date: 18-06-2018 Through 20-06-2018",

}

RIS (suitable for import to EndNote) - Download

TY - GEN

T1 - Photonic superlattice multilayers for EUV lithography infrastructure

AU - Kuchar, F.

AU - Meisels, R.

PY - 2018/1/1

Y1 - 2018/1/1

KW - Bragg reflectors

KW - Extreme ultraviolet

KW - Photonic crystals

KW - Superlattices

UR - http://www.scopus.com/inward/record.url?scp=85054677555&partnerID=8YFLogxK

U2 - 10.1117/12.2322410

DO - 10.1117/12.2322410

M3 - Conference contribution

AN - SCOPUS:85054677555

SN - 9781510621213

VL - 10775

BT - 34th European Mask and Lithography Conference

PB - SPIE

T2 - 34th European Mask and Lithography Conference, EMLC 2018

Y2 - 18 June 2018 through 20 June 2018

ER -

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