Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

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Oxidation and wet etching behavior of sputtered Mo-Ti-Al films. / Jörg, Tanja; Hofer-Roblyek, Anna Maria; Köstenbauer, Harald et al.
In: Journal of vacuum science & technology / A (JVST), Vol. 36, 2018, p. 021513-1-021513-5.

Research output: Contribution to journalArticleResearchpeer-review

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@article{1716c458c49b4e2a9e9e88eb91db28ed,
title = "Oxidation and wet etching behavior of sputtered Mo-Ti-Al films",
author = "Tanja J{\"o}rg and Hofer-Roblyek, {Anna Maria} and Harald K{\"o}stenbauer and J{\"o}rg Winkler and Christian Mitterer",
year = "2018",
doi = "10.1116/1.5009289",
language = "English",
volume = "36",
pages = "021513--1--021513--5",
journal = "Journal of vacuum science & technology / A (JVST)",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

AU - Jörg, Tanja

AU - Hofer-Roblyek, Anna Maria

AU - Köstenbauer, Harald

AU - Winkler, Jörg

AU - Mitterer, Christian

PY - 2018

Y1 - 2018

U2 - 10.1116/1.5009289

DO - 10.1116/1.5009289

M3 - Article

VL - 36

SP - 021513-1-021513-5

JO - Journal of vacuum science & technology / A (JVST)

JF - Journal of vacuum science & technology / A (JVST)

SN - 0734-2101

ER -