Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5
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Translated title of the contribution | Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5 |
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Original language | English |
Pages (from-to) | 335203-335210 |
Journal | Journal of physics / D, Applied physics |
Volume | 46 |
DOIs | |
Publication status | Published - 2013 |